Beilstein J. Nanotechnol.2018,9, 555–579, doi:10.3762/bjnano.9.53
; focused electron beam induced deposition; heteronuclearFEBIDprecursors; surface science; Introduction
Direct-write technologies using electron beams for nanostructure deposition can surpass the limitations of standard lithography techniques, such as the growth of three-dimensional nanostructures with
PDF
Figure 1:
Structural arrangement of HFeCo3(CO)12 and H2FeRu3(CO)13 illustrating differences in symmetry and l...